Published May 7, 2015 | Version v1
Journal article Metadata-only

Effect of Ru thickness on spin pumping in Ru/Py bilayer

Creators

  • 1. Department of Physics, Thin Film Laboratory, Indian Institute of Technology Delhi, New Delhi 110016 (India)

Description

We report the effect of Ru thickness (tRu) on ferromagnetic resonance (FMR) line-width of Ru(tRu)/Py(23 nm) bilayer samples grown on Si(100)/SiO2 substrates at room temperature by magnetron sputtering. The FMR line-width is found to vary linearly with frequency for all thicknesses of Ru, indicating intrinsic origin of damping. For Ru thicknesses below 15 nm, Gilbert-damping parameter, α is almost constant. We ascribe this behavior to spin back flow that is operative for Ru thicknesses lower than the spin diffusion length in Ru, λsd. For thicknesses >15 nm (>λsd), the damping constant increases with Ru thickness, indicating spin pumping from Py into Ru

Additional details

Identifiers

DOI
10.1063/1.4913510;

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
117
Journal Issue
17
Journal Page Range
vp.
ISSN
0021-8979
CODEN
JAPIAU

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46115783
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
DIFFUSION LENGTH; FERROMAGNETIC RESONANCE; INTERFACES; LAYERS; LINE WIDTHS; RUTHENIUM; SILICA; SILICON; SILICON OXIDES; SPIN; SPUTTERING; SUBSTRATES; TEMPERATURE RANGE 0273-0400 K; THICKNESS; THIN FILMS
Descriptors DEC
ANGULAR MOMENTUM; CHALCOGENIDES; DIMENSIONS; ELEMENTS; FILMS; LENGTH; MAGNETIC RESONANCE; METALS; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PARTICLE PROPERTIES; PLATINUM METALS; REFRACTORY METALS; RESONANCE; SEMIMETALS; SILICON COMPOUNDS; TEMPERATURE RANGE; TRANSITION ELEMENTS

Optional Information

Notes
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