Published July 1, 2013 | Version v1
Journal article

Fabrication of curved PDMS microstructures on silica glass by proton beam writing aimed for micro-lens arrays on transparent substrates

  • 1. Dept. of Electrical Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto-ku, Tokyo 135-8548 (Japan)
  • 2. Research Organization for Advanced Engineering, Center for Flexible System Integration, 307 Fukasaku, Minuma-ku, Saitama-shi, Saitama 337-8570 (Japan)

Description

Polydimethylsiloxane (PDMS), a type of silicone rubber, has excellent material properties such as flexibility, optical transparency and biocompatibility. Therefore, it can offer possible applications in the field of microfluidics as flexible micro-optical components, when they can be formed on transparent materials such as silica glass. We performed proton beam writing (PBW) (with 1.0 MeV beam) on PDMS microstructures with curved surface on silica glass. We found that 13-μm thick PDMS films on silica glass are sensitive only for proton fluences above 600 nC/mm2 in contrast with the sensitivity of 4.0 nC/mm2 when using a silicon substrate. Based on the hypothesis that the effective sensitivity was lower due to the electric charging of silica glass surface during PBW, we coated the silica glass surface by Au sputtering. As a result, we were able to observe the formation of PDMS on the Au-coated silica glass at a much lower fluence of 2.0 nC/mm2. Arrays of curved PDMS structures with a height of 13 μm and diameter of 40 μm have been fabricated on a semi-transparent Au-coated silica glass

Availability note (English)

Available from http://dx.doi.org/10.1016/j.nimb.2012.12.032

Additional details

Identifiers

DOI
10.1016/j.nimb.2012.12.032;
PII
S0168-583X(12)00793-8;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
306
Journal Page Range
p. 284-287
ISSN
0168-583X
CODEN
NIMBEU

Conference

Title
13. international conference on microprobe technology and applications; 6. workshop on proton beam writing
Acronym
ICNMATA2012
Dates
22-27 Jul 2012
Place
Lisbon (Portugal)

Optional Information

Copyright
Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.