Laser deposition of large thin films by the mask method

A new method of laser deposition of the uniform in thickness and composition large area thin films is proposed. A peculiarity of this method is the matter deposition through a mask on a rotating substrate, whereby the mask is placed in the immediate vicinity of the substrate. Various configurations of mask slits that provide thickness uniformity of the deposited films are considered. The accurate size of the mask is calculated proceeding from an angle distribution of mass-transfer in a laser plume. 6 refs