Published December 30, 1975 | Version v1
Patent Open

Ion beam apparatus with separately replaceable elements

Description

In an ion beam apparatus wherein ions are generated by the collision of electrons from a filamentary emitter with gas atoms in the vicinity of an electron-attracting grid structure, with subsequent extraction of the ions so generated from the vicinity of the grid structure and the focusing of these ions into a beam by an electrostatic lens system, a new way of mounting the ion extractor and the electrostatic lens system is disclosed which facilitates the removal and replacement of the filament and the grid structure. A configuration of the grid structure is also disclosed which optimizes the profile and the current density of the ion beam

Availability note (English)

MF available from INIS under the Report Number.

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Additional details

Additional titles

Augmented title (English)
Patent

Publishing Information

Imprint Pagination
10 p.
IPC:
Int. Cl.G01k1/08.
IPC
Int. Cl.G01k1/08.
Patent number
US patent document 3,930,163

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
7253157
Subject category
S74: ATOMIC AND MOLECULAR PHYSICS;
Descriptors DEI
ARGON IONS; BEAM OPTICS; BEAM PRODUCTION; ION BEAMS; ION SOURCES; SPUTTERING
Descriptors DEC
BEAMS; CHARGED PARTICLES; IONS