Published March 19, 1985 | Version v1
Patent Metadata-only

Thin film deposition using plasma-generated source gas

Creators

Description

An apparatus and method for depositing a layer of a surface-compatible material from the gas phase onto a selected surface area of a substrate body using a plasma adjacent the substrate body to create a source gas which is decomposed by a laser or other source of energy on the selected surface area. The plasma-generated source gas may be varied by changing targets within the plasma or the reactant gases, and the laser energy may cause decomposition of the source gas by photolysis or pyrolysis or a combination of both

Availability note (English)

U.S. Commissioner of Patents, Washington, D.C. 20231, USA, $.50.

Additional details

Publishing Information

Imprint Pagination
v p.
IPC:
Int. Cl. B05D 3/06.
IPC
Int. Cl. B05D 3/06.
Patent number
US patent document 4,505,949/A/

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
17009832
Subject category
S42: ENGINEERING;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
FABRICATION; INTEGRATED CIRCUITS; LASER RADIATION; PHOTOLYSIS; PLASMA; PYROLYSIS; SUBSTRATES; SURFACE COATING
Descriptors DEC
CHEMICAL REACTIONS; DECOMPOSITION; DEPOSITION; ELECTROMAGNETIC RADIATION; ELECTRONIC CIRCUITS; RADIATIONS

Optional Information

Notes
PAT-APPL-603545.