Published October 1, 2010
| Version v1
Journal article
Catalytic and photocatalytic activity of lightly doped catalysts M:ZnO (M = Cu, Mn)
- 1. Faculty of Chemistry, University of Sofia, 1 J. Bouchier Av., Sofia 1164 (Bulgaria)
- 2. Institute of General and Inorganic Chemistry, BAS, Acad. G.Bonchev Str., bl 11, Sofia 1113 (Bulgaria)
Description
This work presents a comprehensive investigation on the effect of small amounts of copper or manganese on the catalytic and photocatalytic activities of ZnO powders. The observed effects are interpreted based on the theory of chemisorption, the physics of semiconductors and the chemistry of non-stoichiometric oxides. It turns out that the nature of the investigated processes is determined mainly by both, the influence of admixtures on the electronic band structure parameters and the alteration of the sorption ability of the semiconductor surface.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.matchemphys.2010.05.015Additional details
Identifiers
- DOI
- 10.1016/j.matchemphys.2010.05.015;
- PII
- S0254-0584(10)00383-4;
Publishing Information
- Journal Title
- Materials Chemistry and Physics
- Journal Volume
- 123
- Journal Issue
- 2-3
- Journal Page Range
- p. 563-568
- ISSN
- 0254-0584
- CODEN
- MCHPDR
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44012594
- Subject category
- S36: MATERIALS SCIENCE; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- CATALYSTS; CHEMISORPTION; CHEMISTRY; COPPER; DOPED MATERIALS; ELECTRONIC STRUCTURE; MANGANESE; PHOTOCATALYSIS; POWDERS; SEMICONDUCTOR MATERIALS; STOICHIOMETRY; SURFACE PROPERTIES; SURFACES; ZINC OXIDES
- Descriptors DEC
- CATALYSIS; CHALCOGENIDES; CHEMICAL REACTIONS; ELEMENTS; MATERIALS; METALS; OXIDES; OXYGEN COMPOUNDS; SEPARATION PROCESSES; SORPTION; TRANSITION ELEMENTS; ZINC COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.