Published October 1974 | Version v1
Book Metadata-only

Optical waveguides from ion implantation

Creators

  • 1. Centre National d'Etudes des Telecommunications (CNET), Centre de Recherches de Lannion, 22 (France)

Description

Optical waveguide fabrication for the visible (amorphous silica) and near infrared (GaAs) is considered. Mechanisms responsible for the increase in the refraction index in implanted layers are reviewed; experimental technics used and results obtained in guiding are presented

Abstract (French)

Dans cette etude, on evoque la realisation de guides optiques dans le visible (silice amorphe) et le proche infra rouge (Arseniure de Gallium). Apres une introduction sur les mecanismes qui sont responsables de l'accroissement d'indice de refraction dans les couches implantees, on presente les techniques experimentales utilisees et les resultats obtenus pour le guidage

Additional details

Additional titles

Original title (French)
Guides d'ondes optiques par implantation ionique

Publishing Information

Publisher
Societe Francaise du Vide.
Imprint Place
Paris, France
Imprint Title
Electron and ion beam processes applications. 4. International congress AVISEM 74. Toulouse, October 8-11, 1974
Imprint Pagination
p. 232-238.

Conference

Title
4. International congress AVISEM 74. Application of electronic and ionic processes.
Dates
08 Oct 1974.
Place
Toulouse, France.

INIS

Country of Publication
France
Country of Input or Organization
France
INIS RN
7240502
Subject category
S07: ISOTOPES AND RADIATION SOURCES; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
GALLIUM ARSENIDES; ION IMPLANTATION; NEAR INFRARED RADIATION; REFRACTION; SILICON OXIDES; VISIBLE RADIATION; WAVEGUIDES
Descriptors DEC
ARSENIC COMPOUNDS; ARSENIDES; CHALCOGENIDES; ELECTROMAGNETIC RADIATION; GALLIUM COMPOUNDS; INFRARED RADIATION; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; SILICON COMPOUNDS

Optional Information

Notes
Imprint:Supplement to the journal Le Vide les Couches Minces no. 171.;Application des processus electroniques et ioniques. 4. Congres international AVISEM 74. Toulouse, 8-11 Octobre 1974.