Published March 15, 2003 | Version v1
Journal article

Dry excimer laser cleaning applied to nuclear decontamination

Description

Excimer laser ablation is a very powerful tool of dry cleaning. This technique allows the removal or oxide or painting deposited on a material without any modifications of the chemical and physical properties of its surface. This method has been effectively used in many areas. In nuclear industry, there is a great interest to develop in developing an efficient dry decontamination process. A review of the main laser decontamination experiments performed in the world is presented. Our laser cleaning prototype based on excimer laser ablation process is described. This prototype has been tested in nuclear facilities. It is mainly composed of a XeCl laser, a bundle of fibers for beam transmission, optical systems, collection cell with filter for ablated particle recovery, computer control of cleaning efficiency and beam displacement. Different kinds of materials, which are representative of contamination usually found in nuclear field, have been irradiated. Decontamination factors (initial activity/residual activity) higher than 15 for fixed contamination and up to 100 for unfixed contamination have been obtained. These performances demonstrate that the laser-based technique is the most efficient one for dry and fast decontamination

Additional details

Identifiers

DOI
10.1016/S0169-4332(02)01360-0;
arXiv
arXiv:hep-th/0110091v2;
PII
S0169433202013600;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
208-209
Journal Issue
1
Journal Page Range
p. 298-305
ISSN
0169-4332
CODEN
ASUSEE

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38086380
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ABLATION; CONTAMINATION; DECONTAMINATION; EXCIMER LASERS; NUCLEAR FACILITIES; NUCLEAR INDUSTRY; OXIDES
Descriptors DEC
CHALCOGENIDES; CLEANING; GAS LASERS; INDUSTRY; LASERS; OXYGEN COMPOUNDS

Optional Information

Copyright
Copyright (c) 2002 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.