Enhancing field electron emission behavior and mechanical properties of hydrogenated amorphous carbon films by incorporating vertically aligned carbon nanowires via facile reactive magnetron sputtering

A reactive magnetron sputtering deposition facility was performed to fabricate well-aligned carbon nanowires (denoted as CNWs) in hydrogenated amorphous carbon (denoted as a-C:H) film via a one-step self-assembly route in the presence of nickel catalyst. The CNWs arrays with different diameters and vertical alignment on substrate surfaces were incorporated in the a-C:H films under different deposition time. The microstructure of the as-fabricated CNWs/a-C:H composite films was analyzed by field emission scanning electron microscopy, high-resolution transmission electron microscopy, Raman spectroscopy, X-ray diffraction, and X-ray photoelectron spectroscopy. Moreover, the field electron emission behavior of CNWs/a-C:H composite films in vacuum was tested with a parallel-plate-electrode system; and their nano-hardness and adhesion to substrate were measured by nano-indentation and nano-scratching tests. Results indicate that the CNWs/a-C:H composite films exhibit greatly increased electric conductivity and nano-hardness as well as desired flexibility. Particularly, the CNWs/a-C:H composite film obtained at a deposition time of 10 min has the optimal comprehensive properties, showing promising potential in the large-area preparation of flexible electronic devices.