Published April 2009 | Version v1
Journal article

Electron beam confinement and image contrast enhancement in near field emission scanning electron microscopy

  • 1. Laboratorium fuer Festkoerperphysik, Eidgenoessische Technische Hochschule Zuerich (ETH), CH-8093 Zuerich (Switzerland)

Description

In conventional scanning electron microscopy (SEM), the lateral resolution is limited by the electron beam diameter impinging on the specimen surface. Near field emission scanning electron microscopy (NFESEM) provides a simple means of overcoming this limit; however, the most suitable field emitter remains to be determined. NFESEM has been used in this work to investigate the W (1 1 0) surface with single-crystal tungsten tips of (3 1 0), (1 1 1), and (1 0 0)-orientations. The topographic images generated from both the electron intensity variations and the field emission current indicate higher resolution capabilities with decreasing tip work function than with polycrystalline tungsten tips. The confinement of the electron beam transcends the resolution limitations of the geometrical models, which are determined by the minimum beam width.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.ultramic.2008.11.009

Additional details

Identifiers

DOI
10.1016/j.ultramic.2008.11.009;
PII
S0304-3991(08)00299-4;

Publishing Information

Journal Title
Ultramicroscopy (Amsterdam)
Journal Volume
109
Journal Issue
5
Journal Page Range
p. 463-466
ISSN
0304-3991
CODEN
ULTRD6

Conference

Title
51. international field emission symposium
Acronym
IFES 2008
Dates
29 Jun - 5 Jul 2008
Place
Rouen (France)

Optional Information

Copyright
Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.