Electron beam confinement and image contrast enhancement in near field emission scanning electron microscopy
- 1. Laboratorium fuer Festkoerperphysik, Eidgenoessische Technische Hochschule Zuerich (ETH), CH-8093 Zuerich (Switzerland)
Description
In conventional scanning electron microscopy (SEM), the lateral resolution is limited by the electron beam diameter impinging on the specimen surface. Near field emission scanning electron microscopy (NFESEM) provides a simple means of overcoming this limit; however, the most suitable field emitter remains to be determined. NFESEM has been used in this work to investigate the W (1 1 0) surface with single-crystal tungsten tips of (3 1 0), (1 1 1), and (1 0 0)-orientations. The topographic images generated from both the electron intensity variations and the field emission current indicate higher resolution capabilities with decreasing tip work function than with polycrystalline tungsten tips. The confinement of the electron beam transcends the resolution limitations of the geometrical models, which are determined by the minimum beam width.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.ultramic.2008.11.009Additional details
Identifiers
- DOI
- 10.1016/j.ultramic.2008.11.009;
- PII
- S0304-3991(08)00299-4;
Publishing Information
- Journal Title
- Ultramicroscopy (Amsterdam)
- Journal Volume
- 109
- Journal Issue
- 5
- Journal Page Range
- p. 463-466
- ISSN
- 0304-3991
- CODEN
- ULTRD6
Conference
- Title
- 51. international field emission symposium
- Acronym
- IFES 2008
- Dates
- 29 Jun - 5 Jul 2008
- Place
- Rouen (France)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44102395
- Subject category
- S36: MATERIALS SCIENCE; S43: PARTICLE ACCELERATORS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BEAM PROFILES; CRYSTAL STRUCTURE; ELECTRON BEAMS; ELECTRONS; FIELD EMISSION; IMAGES; MONOCRYSTALS; ORIENTATION; POLYCRYSTALS; RESOLUTION; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SURFACES; TUNGSTEN; WORK FUNCTIONS
- Descriptors DEC
- BEAMS; CRYSTALS; ELECTRON MICROSCOPY; ELEMENTARY PARTICLES; ELEMENTS; EMISSION; FERMIONS; FUNCTIONS; LEPTON BEAMS; LEPTONS; METALS; MICROSCOPY; PARTICLE BEAMS; REFRACTORY METALS; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.