Decomposition processes of photoresist polymers by H atoms produced on hot wire surfaces

Mass spectrometry was used to identify the decomposition products of two typical photoresist polymers, Novolak and polymethylmethacrylate, by H atoms produced on hot wire surfaces. The production of CH₄ and CO was confirmed for both polymers. Other possible products are C₃H₈, C₄H₁₀ or C₄H₈, and some esters such as CH₃COOC₂H₅. The production of CO₂, C₂H₄, C₂H₆, alcohols, and aromatics are minor. The possible decomposition mechanisms are discussed on the basis of density functional calculations of the energetics. - Highlights: • The decomposition products of photoresist polymers by H atoms were identified. • Density functional calculations were also carried out to specify the initial step. • The initial step is the abstraction or the addition to produce surface radicals. • These surface radicals accept H atoms, leading to C-C bond cleavages.