Monte Carlo simulation of intermixed layer formation during ion plating of Cu on Al2O3

Monte Carlo simulation of intermixed layer formation during ion plating of Cu on Al2O3 has been carried out in the binary collision approximation using the DYNA code. Dependences of elemental concentrations on depth for different values of ion energy have been obtained at a fixed ion fraction in the total flux incident particles. A semiempirical expression which allows us to estimate the interlayer thickness dependence on two main parameters of the ion plating process has been derived on the basis of simulation results and a simplified model of interlayer formation. The ratio of aluminium to oxygen concentrations in the interlayer region was found to differ significantly from the corresponding value in the surface depth. (orig.)