Tailoring microstructure, mechanical and tribological properties of NiTi thin films by controlling in-situ annealing temperature
- 1. Institute of Materials Engineering, Technical University of Dortmund, Leonhard-Euler-Str 2, 44227 Dortmund (Germany)
- 2. Electron Microscopy Department of Materials Science, University of Ulm, Albert-Einstein-Allee 11, 89081 Ulm (Germany)
Description
Magnetron sputtered near equiatomic NiTi thin films were deposited on Si (100) and hot work tool steel substrates. The deposited thin films were in-situ annealed at four different temperatures viz., 80 °C, 305 °C, 425 °C, and 525 °C. The effect of the in-situ annealing temperature on the microstructure of the film, the morphology, as well as mechanical and tribological properties was studied using X-ray diffraction, synchrotron diffraction, transmission electron microscopy, energy dispersive X-ray spectroscopy, ball-on-disc, scratch test, and three dimensional optical microscopy. The obtained results revealed how the variation of in-situ annealing temperature affects the crystallization, microstructure evolution, as well as mechanical and tribological properties of NiTi thin films. - Highlights: • In-situ annealed thin films at 80 °C are amorphous with poor tribological behavior. • In-situ annealed thin films at 305 °C have metallic glasses coating materials. • In-situ annealing above 425 °C resulted in the formation of shape memory effect. • In-situ annealing at 305 °C and 525 °C resulted in an excellent tribological behavior.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2017.02.052Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2017.02.052;
- PII
- S0040-6090(17)30151-7;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 628
- Journal Page Range
- p. 13-21
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 50023883
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ADHESION; ANNEALING; CRYSTALLIZATION; DEPOSITS; MAGNETRONS; METALLIC GLASSES; MICROSTRUCTURE; OPTICAL MICROSCOPY; SHAPE MEMORY EFFECT; SPUTTERING; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION; X-RAY SPECTROSCOPY
- Descriptors DEC
- COHERENT SCATTERING; DIFFRACTION; ELECTRON MICROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; FILMS; HEAT TREATMENTS; MICROSCOPY; MICROWAVE EQUIPMENT; MICROWAVE TUBES; PHASE TRANSFORMATIONS; SCATTERING; SPECTROSCOPY
Optional Information
- Copyright
- Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.