The annealing of double-heterostructure GaInAsP-InP 1.3 μm laser diodes
Creators
- 1. School of Electrical Engineering, Nanyang Technological Inst., Singapore 263 (Singapore)
Description
Subsequent to fabrication, double-heterostructure laser diodes with planar GaInAsP active regions are subjected to an annealing or burn-in process during which they are operated at a constant 5 mW light-output power at a temperature of 50 degrees C. In general, small increases of drive current are found in the first 1000 to 2000 h of operation after which the lasers settle down. In the present diodes, drive current increases of typically 6% occurred. There is little change in threshold current and the changes seen are mainly due to a decrease in slope efficiency. In all cases the changes decrease gradually after about 2000 h and revert to the behavior expected of long lived and reliable quaternary lasers. A model for the annealing of double-heterostructure laser diodes has been successfully extended to describe these effects
Additional details
Publishing Information
- Journal Title
- IEEE Journal of Quantum Electronics
- Journal Volume
- 27
- Journal Issue
- 1
- Series
- IEEE J. Quantum Electron.
- Journal Page Range
- 30-39
- ISSN
- 0018-9197
- CODEN
- IEJQA
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 22054811
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; ARSENIC COMPOUNDS; CRYSTAL DEFECTS; DIFFUSION; EFFICIENCY; GALLIUM COMPOUNDS; HETEROJUNCTIONS; INDIUM COMPOUNDS; INDIUM PHOSPHIDES; MEDIUM TEMPERATURE; NEAR INFRARED RADIATION; PHOSPHORUS COMPOUNDS; SEMICONDUCTOR DIODES; SEMICONDUCTOR LASERS; THRESHOLD ENERGY; VARIATIONS
- Descriptors DEC
- AMPLIFIERS; CRYSTAL STRUCTURE; ELECTROMAGNETIC RADIATION; ENERGY; EQUIPMENT; HEAT TREATMENTS; INFRARED RADIATION; LASERS; PHOSPHIDES; PNICTIDES; RADIATIONS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR JUNCTIONS; SOLID STATE LASERS