Published January 2006
| Version v1
Journal article
Studies of the composition, mechanical and electrical properties of N-doped carbon films prepared by DC-MFCAD
- 1. College of Science and Technology, Hainan University, Haikou 570228 (China)
- 2. Key Laboratory of Biomaterial Surface Modification of Sichuan, Laboratory of Advanced Materials Processing of Chinese Education Ministry, Southwest Jiaotong University, Chengdu 610031 (China)
- 3. School of Material Science and Engineering, Northwest Polytechnical University, State Key Laboratory of Solidification Processing, Xi'an 710072 (China)
Description
N-doped carbon films were prepared on Si(1 0 0) and Ti-6Al-4V substrates using direct current magnetically filtered cathodic arc deposition (DC-MFCAD) at room temperature for various different N2 pressures. The structure and composition of the films were characterized by Raman spectroscopy and X-ray photoelectron spectroscopy (XPS). Ball-on-disk and microhardness tests were used to characterize the mechanical properties of the films, and Hall effect tests were employed to study the electrical properties
Additional details
Identifiers
- DOI
- 10.1016/j.nimb.2005.08.070;
- PII
- S0168-583X(05)01537-5;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
- Journal Volume
- 242
- Journal Issue
- 1-2
- Journal Page Range
- p. 324-327
- ISSN
- 0168-583X
- CODEN
- NIMBEU
Conference
- Title
- 14. international conference on ion beam modification of materials
- Dates
- 5-10 Sep 2004
- Place
- Pacific Grove, CA (United States)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37068449
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CARBON; DEPOSITION; DIRECT CURRENT; DOPED MATERIALS; ELECTRICAL PROPERTIES; FILMS; HALL EFFECT; MICROHARDNESS; RAMAN SPECTRA; RAMAN SPECTROSCOPY; SUBSTRATES; TEMPERATURE RANGE 0273-0400 K; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CURRENTS; ELECTRIC CURRENTS; ELECTRON SPECTROSCOPY; ELEMENTS; HARDNESS; LASER SPECTROSCOPY; MATERIALS; MECHANICAL PROPERTIES; NONMETALS; PHOTOELECTRON SPECTROSCOPY; PHYSICAL PROPERTIES; SPECTRA; SPECTROSCOPY; TEMPERATURE RANGE
Optional Information
- Copyright
- Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.