Published May 2001 | Version v1
Journal article Metadata-only

Effects of the filtering duct magnetic field in a modified vacuum arc deposition apparatus

Creators

  • 1. Beijing Normal Univ., Beijing (China). Center of Analytical and Testing
  • 2. Beijing Normal Univ., Beijing (China). Inst. of Low Energy Nuclear Physics

Description

When the magnetic filter duct is biased positively 30-60 V relative to the cathode of the MEVVA plasma source, a cathodic vacuum arc discharge is generated between the duct and the cathode. With this modified vacuum arc deposition apparatus, the effects of the filter duct magnetic field on the cathodic arc discharge and the plasma transport are studied. It is shown that the scale of the arc discharge between the filter duct and the cathode decreases, and the efficiency of the plasma transport increases with increasing filtering magnetic field. The duct magnetic field has no effect on the arc discharge between the anode and cathode of the MEVVA plasma source

Additional details

Publishing Information

Journal Title
Atomic Energy Science and Technology
Journal Volume
35
Journal Issue
3
Journal Page Range
p. 229-233
ISSN
1000-6931

INIS

Country of Publication
China
Country of Input or Organization
China
INIS RN
32044508
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
DUCTS; MAGNETIC FIELDS; MAGNETIC FILTERS; MODIFICATIONS; PLASMA ARC SPRAYING
Descriptors DEC
DEPOSITION; FILTERS; SPRAY COATING; SURFACE COATING