Modeling electron emission and surface effects from diamond cathodes
Creators
- 1. Tech-X Corporation, Boulder, CO (United States)
- 2. Brookhaven National Lab. (BNL), Upton, NY (United States)
Description
We developed modeling capabilities, within the Vorpal particle-in-cell code, for three-dimensional (3D) simulations of surface effects and electron emission from semiconductor photocathodes. They include calculation of emission probabilities using general, piece-wise continuous, space-time dependent surface potentials, effective mass and band bending field effects. We applied these models, in combination with previously implemented capabilities for modeling charge generation and transport in diamond, to investigate the emission dependence on applied electric field in the range from approximately 2 MV/m to 17 MV/m along the [100] direction. The simulation results were compared to experimental data. For the considered parameter regime, conservation of transverse electron momentum (in the plane of the emission surface) allows direct emission from only two (parallel to [100]) of the six equivalent lowest conduction band valleys. When the electron affinity χ is the only parameter varied in the simulations, the value χ = 0.31 eV leads to overall qualitative agreement with the probability of emission deduced from experiments. Including band bending in the simulations improves the agreement with the experimental data, particularly at low applied fields, but not significantly. In this study, using surface potentials with different profiles further allows us to investigate the emission as a function of potential barrier height, width, and vacuum level position. However, adding surface patches with different levels of hydrogenation, modeled with position-dependent electron affinity, leads to the closest agreement with the experimental data
Availability note (English)
Available from: DOI:10.1063/1.4907393 ; DOE Accepted Manuscript full text, or the publishers Best Available Version will be available free of charge after the embargo period from OSTI using http://www.osti.gov/pages/biblio/1183839Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Applied Physics
- Journal Volume
- 117
- Journal Issue
- 5
- Journal Page Range
- vp.
- ISSN
- 0021-8979
- CODEN
- JAPIAU
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 47051971
- Subject category
- S43: PARTICLE ACCELERATORS;
- Descriptors DEI
- ELECTRIC FIELDS; ELECTRON EMISSION; ELECTRONS; PHOTOCATHODES; SEMICONDUCTOR MATERIALS; SIMULATION; THREE-DIMENSIONAL CALCULATIONS
- Descriptors DEC
- CATHODES; ELECTRODES; ELEMENTARY PARTICLES; EMISSION; FERMIONS; LEPTONS; MATERIALS
Optional Information
- Contract/Grant/Project number
- SC00112704
- Funding organization
- USDOE Office of Science, Nuclear Physics (SC-26) (United States)
- Secondary number(s)
- BNL--107899-2015-JA; OSTIID--1183839