Published February 5, 2015 | Version v1
Journal article

Modeling electron emission and surface effects from diamond cathodes

  • 1. Tech-X Corporation, Boulder, CO (United States)
  • 2. Brookhaven National Lab. (BNL), Upton, NY (United States)

Description

We developed modeling capabilities, within the Vorpal particle-in-cell code, for three-dimensional (3D) simulations of surface effects and electron emission from semiconductor photocathodes. They include calculation of emission probabilities using general, piece-wise continuous, space-time dependent surface potentials, effective mass and band bending field effects. We applied these models, in combination with previously implemented capabilities for modeling charge generation and transport in diamond, to investigate the emission dependence on applied electric field in the range from approximately 2 MV/m to 17 MV/m along the [100] direction. The simulation results were compared to experimental data. For the considered parameter regime, conservation of transverse electron momentum (in the plane of the emission surface) allows direct emission from only two (parallel to [100]) of the six equivalent lowest conduction band valleys. When the electron affinity χ is the only parameter varied in the simulations, the value χ = 0.31 eV leads to overall qualitative agreement with the probability of emission deduced from experiments. Including band bending in the simulations improves the agreement with the experimental data, particularly at low applied fields, but not significantly. In this study, using surface potentials with different profiles further allows us to investigate the emission as a function of potential barrier height, width, and vacuum level position. However, adding surface patches with different levels of hydrogenation, modeled with position-dependent electron affinity, leads to the closest agreement with the experimental data

Availability note (English)

Available from: DOI:10.1063/1.4907393 ; DOE Accepted Manuscript full text, or the publishers Best Available Version will be available free of charge after the embargo period from OSTI using http://www.osti.gov/pages/biblio/1183839

Additional details

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
117
Journal Issue
5
Journal Page Range
vp.
ISSN
0021-8979
CODEN
JAPIAU

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
47051971
Subject category
S43: PARTICLE ACCELERATORS;
Descriptors DEI
ELECTRIC FIELDS; ELECTRON EMISSION; ELECTRONS; PHOTOCATHODES; SEMICONDUCTOR MATERIALS; SIMULATION; THREE-DIMENSIONAL CALCULATIONS
Descriptors DEC
CATHODES; ELECTRODES; ELEMENTARY PARTICLES; EMISSION; FERMIONS; LEPTONS; MATERIALS

Optional Information

Contract/Grant/Project number
SC00112704
Funding organization
USDOE Office of Science, Nuclear Physics (SC-26) (United States)
Secondary number(s)
BNL--107899-2015-JA; OSTIID--1183839