Published May 1994 | Version v1
Journal article

Applications of intense pulsed ion beam to materials science

  • 1. Laboratory of Beam Technology and Department of Electrical Engineering, Nagaoka University of Technology, Nagaoka, Niigata 940-21 (Japan)
  • 2. R ampersand D Center, Nippon Seiki Co. Ltd., Nagaoka, Niigata 940-21 (Japan)
  • 3. Central Research Institute, Mitsubishi Materials Co., Ohmiya, Saitama 330 (Japan)
  • 4. Nichicon Co., Oike Karasuma, Nakagyo-ku, Kyoto 604 (Japan)

Description

In addition to being initially developed as an energy driver for an inertial confinement fusion, an intense, pulsed, light-ion beam (LIB) has been found to be applied to materials science. If a LIB is used to irradiate targets, a high-density ''ablation'' plasma is produced near the surface since the range of the LIB in materials is very short. Since the first demonstration of quick preparation of thin films of ZnS by an intense, pulsed, ion-beam evaporation (IBE) using the LIB-produced ablation plasma, various thin films have been successfully prepared, such as of ZnS:Mn, YBaCuO, BaTiO3, cubic BN, SiC, ZrO2, ITO, B, C, and apatite. Some of these data will be presented in this paper, with its analytic solution derived from a one-dimensional, hydrodynamic, adiabatic expansion model for the IBE. The temperature will be deduced using ion-flux signals measured by a biased ion collector. Reasonable agreement is obtained between the experiment and the simulation. High-energy LIB implantation to make chemical compounds and the associated surface modification are also discussed

Additional details

Publishing Information

Journal Title
Physics of Plasmas
Journal Volume
1
Journal Issue
5
Journal Page Range
p. 1730-1737.
ISSN
1070-664X
CODEN
PHPAEN