Published 1991 | Version v1
Book

Thermal spike model of ion-induced grain growth

  • 1. Argonne National Lab., IL (United States). Materials Science and Technology Div.
  • 2. Michigan Univ., Ann Arbor, MI (United States). Dept. of Nuclear Engineering

Description

This paper reports on a thermal spike model developed to describe the phenomenon of ion irradiation-induced grain growth in metal alloy thin films. In single phase films where the driving force for grain growth is the reduction of grain boundary curvature, the model shows that ion-induced grain boundary mobility, Mion, is proportional to the quantity FD2/Δcoh3, where FD is the ion and recoil energy deposited in nuclear interactions and ΔHcoh is the cohesive energy of the element or alloy. Experimental grain growth results from ion irradiated coevaporated binary alloy films compare favorably with model predictions

Additional details

Publishing Information

Publisher
Materials Research Society.
Imprint Place
Pittsburgh, PA (United States)
ISBN
1-55899-094-1
Imprint Title
Evolution of thin-film and surface microstructure
Imprint Pagination
731 p.
Journal Page Range
p. 205-210.

Conference

Title
Fall meeting of the Materials Research Society (MRS).
Dates
24 Nov - 1 Dec 1990.
Place
Boston, MA (United States).

Optional Information