Published May 1970 | Version v1
Journal article Metadata-only

The connection between amorphization and forming of point defects following ion bombardment of germanium and silicon

Creators

  • 1. Gor'kovskij Gosudarstvennyj Univ. (USSR). Issledovatel'skij Fiziko-Tekhnicheskij Inst.

Description

no abstract available

Additional details

Additional titles

Original title (Russian)
Связь между аморфизацией и образованием точечных дефектов при ионной бомбардировке германия и кремния

Publishing Information

Journal Title
Dokl. Akad. Nauk SSSR
Journal Volume
192
Journal Issue
2
Series
Dokl. Akad. Nauk SSSR.
Journal Page Range
324-326

INIS

Country of Publication
USSR
Country of Input or Organization
USSR
INIS RN
2006600
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Progress Report
Descriptors DEI
GERMANIUM; SILICON; POINT DEFECTS; IONS; BOMBARDMENT; AMORPHOUS STATE; RADIATION EFFECTS