Published March 21, 2016 | Version v1
Journal article

Influence of active element Ti on interfacial reaction and soldering strength between Sn3.5Ag4Ti(Ce,Ga) alloy filler and Si substrate

  • 1. School of Electronic and Information Engineering, South China University of Technology, Wushan R.D., Tianhe District, Guangzhou 510641 (China)
  • 2. China Electronic Product Reliability and Environmental Testing Research Institute, Dongguanzhuang R.D., Tianhe District, Guangzhou 510610 (China)

Description

The influence of titanium on the interfacial reaction and soldering strength between Sn3.5Ag4Ti(Ce,Ga) and silicon substrates has been studied. The microstructure, the distribution of the elements, and the new phases formed at the interface were investigated. It is observed that the Sn3.5Ag4Ti(Ce,Ga) solder can wet the silicon well under the agitation of external force. The titanium element could be found to obviously segregate at the silicon/solder interface by element mapping, and some discontinuous reaction products could be found at the silicon/solder interface by transmission electron microscopy (TEM). Theoretical analysis results suggest that there might be two soldering mechanisms coexisting in the soldering process, the chemical adsorption of Ti on the silicon surface and the interfacial reaction between Si substrate and Sn3.5Ag4Ti(Ce,Ga) solder. Both of them play important roles in realizing reliable bonding of silicon to silicon. The interfacial model between Si and Sn3.5Ag4Ti(Ce,Ga) active solder was established to explain the bonding mechanism. The shear strengths of the soldered silicon/silicon joints were measured and the effects of Ti on the bonding strength are discussed.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.msea.2016.01.100

Additional details

Identifiers

DOI
10.1016/j.msea.2016.01.100;
PII
S0921-5093(16)30099-5;

Publishing Information

Journal Title
Materials Science and Engineering. A, Structural Materials: Properties, Microstructure and Processing
Journal Volume
658
Journal Page Range
p. 42-49
ISSN
0921-5093
CODEN
MSAPE3

Optional Information

Copyright
Copyright (c) 2016 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.