Published August 6, 2001 | Version v1
Journal article

Ultrasensitive Si phototransistors with a punchthrough base

Description

Si phototransistors with a punchthrough base were fabricated with regular planar technology. Optical conversion gains larger than 15000 were observed. In addition to very high gain, the unique structure of the device also resulted in a fast transient response as well as low output noise. The measured full width at half maximum of the device transient response is 1.6 ns and a -3 dB bandwidth of 300 MHz. The measured output noises at different currents can be well fitted by the relation in2=2qIC. Copyright 2001 American Institute of Physics

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
79
Journal Issue
6
Journal Page Range
p. 773-775
ISSN
0003-6951

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
32052733
Subject category
S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
Descriptors DEI
FABRICATION; PHOTODETECTORS; PHOTOTRANSISTORS; SI SEMICONDUCTOR DETECTORS; TRANSIENTS
Descriptors DEC
MEASURING INSTRUMENTS; RADIATION DETECTORS; SEMICONDUCTOR DETECTORS; SEMICONDUCTOR DEVICES; TRANSISTORS

Optional Information

Notes
Othernumber: APPLAB000079000006000773000001; 002132APL
Funding organization
United States (United States)