Published August 6, 2001
| Version v1
Journal article
Ultrasensitive Si phototransistors with a punchthrough base
Creators
Description
Si phototransistors with a punchthrough base were fabricated with regular planar technology. Optical conversion gains larger than 15000 were observed. In addition to very high gain, the unique structure of the device also resulted in a fast transient response as well as low output noise. The measured full width at half maximum of the device transient response is 1.6 ns and a -3 dB bandwidth of 300 MHz. The measured output noises at different currents can be well fitted by the relation in2=2qIC. Copyright 2001 American Institute of Physics
Additional details
Identifiers
- DOI
- 10.1063/1.1390477;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 79
- Journal Issue
- 6
- Journal Page Range
- p. 773-775
- ISSN
- 0003-6951
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 32052733
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- FABRICATION; PHOTODETECTORS; PHOTOTRANSISTORS; SI SEMICONDUCTOR DETECTORS; TRANSIENTS
- Descriptors DEC
- MEASURING INSTRUMENTS; RADIATION DETECTORS; SEMICONDUCTOR DETECTORS; SEMICONDUCTOR DEVICES; TRANSISTORS
Optional Information
- Notes
- Othernumber: APPLAB000079000006000773000001; 002132APL
- Funding organization
- United States (United States)