Published 1987 | Version v1
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Hydrogen diffusion in tantalum

Creators

  • 1. Bhabha Atomic Research Centre, Bombay (India). Chemistry Div.

Description

Using resistivity technique, the diffusion of hydrogen in tantalum has been studied in the temperature range of 298-373 K. The diffusivity values obtained obey the following Arrhenius equation: D=4.38x10-4 exp(-0.142/kT) cm2/sec. The diffusion parameters agree with those obtained by others. The data has been interpreted in terms of modified over barrier diffusion mechanism. (author). 8 refs., 1 table, 4 figures

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Publishing Information

Imprint Pagination
9 p.
Report number
BARC--1379

INIS

Country of Publication
India
Country of Input or Organization
India
INIS RN
19087451
Subject category
S36: MATERIALS SCIENCE; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Resource subtype / Literary indicator
Numerical Data
Descriptors DEI
ANNEALING; ARRHENIUS EQUATION; BCC LATTICES; DIFFUSION; ELECTRIC CONDUCTIVITY; EXPERIMENTAL DATA; HYDROGEN; MEDIUM TEMPERATURE; TANTALUM; TIME DEPENDENCE
Descriptors DEC
CRYSTAL LATTICES; CRYSTAL STRUCTURE; CUBIC LATTICES; DATA; ELECTRICAL PROPERTIES; ELEMENTS; HEAT TREATMENTS; INFORMATION; METALS; NONMETALS; NUMERICAL DATA; PHYSICAL PROPERTIES; TRANSITION ELEMENTS