Published April 3, 2024 | Version v1
Journal article

Dynamical Nonlinear Inversion of the Surface Photovoltage at Si(100)

  • 1. Institute of Experimental Physics, TU Bergakademie Freiberg, 09599 Freiberg, Germany
  • 2. Center for Efficient High Temperature Processes and Materials Conversion (ZeHS), TU Bergakademie Freiberg, 09599 Freiberg, Germany
  • 3. Chemical Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
  • 4. Center Center for Free-Electron Laser Science CFEL, Deutsches Elektronen-Synchrotron DESY, 22607 Hamburg, Germany
  • 5. Institute of Applied Physics, TU Bergakademie Freiberg, 09599 Freiberg, Germany

Description

A surface photovoltage (SPV) is observed whenever a doped semiconductor with non-negligible band bending is illuminated by light and charge carriers are excited across the band gap. The sign of the SPV depends on the nature of the doping, the amplitude of the SPV increases with the fluence of the light illumination up to a saturation value, which is determined by the doping concentration. We have investigated Si(100) samples with well-characterized doping levels over a wide range of illumination fluences. Surprisingly, the sign of the SPV upon illumination with 532 nm photons reverses for some p-doping concentrations at high fluences. This is a new effect associated with a crossover between electronic excitations in the bulk and at the surface of the semiconductor.

Additional details

Identifiers

DOI
10.1103/PhysRevLett.132.146201;
Crossref Funder ID
10.13039/501100009318; 10.13039/501100002347; 10.13039/100000015; 10.13039/100005156;

Publishing Information

Journal Title
Physical Review Letters
Journal Volume
132
Journal Issue
14
Journal Page Range
6 pgs.
ISSN
0031-9007

Optional Information

Copyright
© 2024 American Physical Society
Contract/Grant/Project number
05K22OF2; DE-AC02-05CH11231; DE-AC02-05CH11231
Notes
Contact Email: Corresponding author: friedrich.roth@physik.tu-freiberg.de; Contact Email: Corresponding author: wolfgang.eberhardt@cfel.de; Present address: European XFEL GmbH, Holzkoppel 4, 22869 Schenefeld, Germany.; Record automatically processed
Funding organization
Helmholtz Association; Bundesministerium für Bildung und Forschung; U.S. Department of Energy; Alexander von Humboldt-Stiftung