Field-emission properties of self-assembled Si-capped Ge quantum dots
- 1. Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan (China)
- 2. Department of Materials Science and Engineering, Ming Hsin Uinversity of Science and Technology, Hsinchu, Taiwan (China)
- 3. Electronics Research and Service Organization, Industrial Technology Research Institute, Hsinchu, Taiwan (China)
Description
Field-emission characteristics of self-assembled Si-capped Ge quantum dots on Si (001) with different Si coverages have been investigated. During capping with Si, Ge quantum dots exhibit a dramatic shape transition from multi-faceted domes to truncated pyramids, and eventually to nanorings. With an appropriate amount of Si-capping to form the truncated pyramids, the field-emission behaviors of Si-capped Ge quantum dots were found to be improved significantly. Based on transmission electron microscope examinations, this improvement can be attributed to the sharper apex of the truncated pyramids as compared to the uncapped domes. However, further Si-capping could degrade the field-emission properties owing to the flattening of Ge islands features. This work provides a useful scheme to utilize self-assembled Si-capped Ge quantum dots as field-emitter arrays
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2005.08.397;
- PII
- S0040-6090(05)01963-2;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 508
- Journal Issue
- 1-2
- Journal Page Range
- p. 218-221
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- 4. international conference on silicon epitaxy and heterostructures
- Acronym
- ICSI-4
- Dates
- 23-26 May 2005
- Place
- Awaji Island, Hyogo (Japan)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38004713
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; FIELD EMISSION; GERMANIUM; QUANTUM DOTS; SILICON; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- CHEMICAL COATING; DEPOSITION; ELECTRON MICROSCOPY; ELEMENTS; EMISSION; METALS; MICROSCOPY; NANOSTRUCTURES; SEMIMETALS; SURFACE COATING
Optional Information
- Copyright
- Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.