Published November 1980
| Version v1
Journal article
The site distribution of amphoteric dopants in multiply-doped GaAs
Description
A chemical thermodynamic approach is used to predict the site distribution and solubility of amphoteric dopants in multiply doped crystals of GaAs. The analysis is applied to experimental results of Greene and of Brozel et al. on GaAs crystals doped with Si and either Sn, Ge or Se. Excellent agreement with the electrically measured carrier concentrations is obtained. It is shown that, whilst Ge commonly behaves as a donor in singly doped GaAs, in the presence of a high silicon concentration it can contribute more acceptors than donors to the crystal. (orig./GMV)
Additional details
Publishing Information
- Journal Title
- J. Cryst. Growth
- Journal Volume
- 50
- Journal Issue
- 3
- Series
- J. Cryst. Growth.
- Journal Page Range
- 638-643
- ISSN
- 0022-0248
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 12597596
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANALYTICAL SOLUTION; CARRIER DENSITY; CARRIER MOBILITY; CRYSTAL DOPING; GALLIUM ARSENIDES; GERMANIUM ADDITIONS; SEGREGATION; SELENIUM ADDITIONS; SILICON ADDITIONS; SOLUBILITY; THERMODYNAMIC MODEL; TIN ADDITIONS
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; GALLIUM COMPOUNDS; MATHEMATICAL MODELS; MOBILITY; PARTICLE MODELS; STATISTICAL MODELS