Two-resonance probe for measuring electron density in low-pressure plasmas
- 1. Department of Plasma Engineering, Korea Institute of Machinery and Materials, Daejeon 305-343 (Korea, Republic of)
- 2. Department of Physics, Chungnam National University, Daejeon 305-701 (Korea, Republic of)
- 3. Center for Vacuum Technology, Korea Research Institute of Standards and Science, Daejeon 305-306 (Korea, Republic of)
- 4. Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology, Daejon 305-701 (Korea, Republic of)
Description
A technique for measuring double-checked electron density using two types of microwave resonance is presented. Simultaneous measurement of the resonances (plasma and quarter-wavelength resonator resonances), which were used for the cutoff probe (CP) and hairpin probe (HP), was achieved by the proposed microwave resonance probe. The developed two-resonance probe (TRP) consists of parallel separated coaxial cables exposing the radiation and detection tips. The structure resembles that of the CP, except the gapped coaxial cables operate not only as a microwave feeder for the CP but also as a U- shaped quarter-wavelength resonator for the HP. By virtue of this structure, the microwave resonances that have typically been used for measuring the electron density for the CP and HP were clearly identified on the microwave transmission spectrum of the TRP. The two types of resonances were measured experimentally under various power and pressure conditions for the plasma. A three-dimensional full-wave simulation model for the TRP is also presented and used to investigate and reproduce the resonances. The electron densities inferred from the resonances were compared and showed good agreement. Quantitative differences between the densities were attributed to the effects of the sheath width and spatial density gradient on the resonances. This accessible technique of using the TRP to obtain double-checked electron densities may be useful for comparative study and provides complementary uses for the CP and HP. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1361-6595/aa5fe7Additional details
Identifiers
Publishing Information
- Journal Title
- Plasma Sources Science and Technology
- Journal Volume
- 26
- Journal Issue
- 4
- Journal Page Range
- [7 p.]
- ISSN
- 0963-0252
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 49075254
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- COAXIAL CABLES; COMPUTERIZED SIMULATION; ELECTRON DENSITY; MICROWAVE RADIATION; PLASMA PRESSURE; PRESSURE RANGE KILO PA; RESONATORS; SPECTRA; THREE-DIMENSIONAL CALCULATIONS; TRANSMISSION; WAVELENGTHS
- Descriptors DEC
- CABLES; CONDUCTOR DEVICES; ELECTRIC CABLES; ELECTRICAL EQUIPMENT; ELECTROMAGNETIC RADIATION; ELECTRONIC EQUIPMENT; EQUIPMENT; PRESSURE RANGE; RADIATIONS; SIMULATION