Published April 30, 2013 | Version v1
Journal article

Role of Ti and Pt electrodes on resistance switching variability of HfO2-based Resistive Random Access Memory

  • 1. CEA LETI, MINATEC Campus, 17 Rue des Martyrs, 38054 Grenoble France (France)
  • 2. Im2np, UMR CNRS 7334, Aix-Marseille Université, 38 Rue Joliot Curie, 13451 Marseille Cedex 20 (France)

Description

This paper deals with the role of platinum or titanium–titanium nitride electrodes on variability of resistive switching characteristics and electrical performances of HfO2-based memory elements. Capacitor-like Pt/HfO2 (10 nm)/Pt and Ti/HfO2 (10 nm)/TiN structures were fabricated on top of a tungsten pillar bottom electrode and integrated in-between two interconnect metal lines. First, quasi-static measurements were performed to apprehend the role of electrodes on electroforming, set and reset operations and their corresponding switching parameters. Memory elements with Pt as top and bottom electrodes exhibited a non-polar behavior with sharp decrease of current during reset operation while Ti/HfO2/TiN capacitors showed a bipolar switching behavior, with a gradual reset. In a second step, statistical distributions of switching parameters (voltage and resistance) were extracted from data obtained on few hundreds of capacitors. Even if the resistance in low resistive state and reset voltage was found to be comparable for both types of electrodes, the progressive reset operation observed on samples with Ti/TiN electrodes led to a lower variability of resistance in high resistive state and concomitantly of set voltage. In addition Ti–TiN electrodes enabled gaining: (i) lower forming and set voltages with significantly narrower capacitor-to-capacitor distributions; (ii) a better data retention capability (10 years at 65 °C instead of 10 years at 50 °C for Pt electrodes); (iii) satisfactory dynamic performances with lower set and reset voltages for ramp speed ranging from 10−2 to 107 V/s. The significant improvement of switching behavior with Ti–TiN electrodes is mainly attributed to the formation of a native interface layer between HfO2 oxide and Ti top electrode. - Highlights: ► HfO2 based capacitor-like structures were fabricated with Pt and Ti based electrodes. ► Influence of electrode materials on switching parameter variability is assessed. ► Switching parameter variability is linked to switching behaviors. ► Data retention and dynamic performances are presented

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2012.11.050

Additional details

Identifiers

DOI
10.1016/j.tsf.2012.11.050;
PII
S0040-6090(12)01547-7;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
533
Journal Page Range
p. 19-23
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
Novel functional materials and nanostructures for innovative non-volatile memory devices
Acronym
EMRS 2012 symposium L
Dates
14-17 May 2012
Place
Strasbourg (France)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47008069
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ELECTRIC POTENTIAL; ELECTRODEPOSITION; ELECTRODES; HAFNIUM OXIDES; PLATINUM; TITANIUM NITRIDES; TUNGSTEN
Descriptors DEC
CHALCOGENIDES; DEPOSITION; ELECTROLYSIS; ELEMENTS; HAFNIUM COMPOUNDS; LYSIS; METALS; NITRIDES; NITROGEN COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PLATINUM METALS; PNICTIDES; REFRACTORY METAL COMPOUNDS; REFRACTORY METALS; SURFACE COATING; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS

Optional Information

Copyright
Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.