Compositional dependence of antiferromagnetic anisotropy in IrMn/CoFe exchange bias systems
Creators
- 1. Department of Physics, University of York, York, YO10 5DD (United Kingdom)
Description
We report on a study of the effect of Ir content on the loop shift (HEX) and anisotropy constant (KAF) in the CoFe/IrMn system. The sample structure investigated was Si/NiCr(5 nm)/Ru(5 nm)/IrxMn1-x/CoFe(2 nm)/Ta(3 nm). All samples were produced by sputtering and the Ir and Mn levels were varied using a specially made composite target and deposited at ∼120 deg. C. The composition of the samples was analyzed using energy dispersive x-ray analysis. KAF was calculated from thermal activation measurements using the York Protocols. A plateau in HEX was found for Ir levels between 16- 20.5 at. %. HEX was found to decrease by 50% on either side of this window. This result is consistent with previous studies where the enhancement of HEX was attributed to an increase in the atomic ordering of the IrMn alloy. However, KAF decreases linearly with increasing Ir concentration and does not appear to correlate with the change in HEX.
Additional details
Identifiers
- DOI
- 10.1063/1.3549568;
Publishing Information
- Journal Title
- Journal of Applied Physics
- Journal Volume
- 109
- Journal Issue
- 7
- Journal Page Range
- p. 07D719-07D719.3
- ISSN
- 0021-8979
- CODEN
- JAPIAU
Conference
- Title
- 55. annual conference on magnetism and magnetic materials
- Dates
- 14-18 Nov 2010
- Place
- Atlanta, GA (United States)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43037680
- Subject category
- S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANISOTROPY; ANTIFERROMAGNETIC MATERIALS; ANTIFERROMAGNETISM; CHEMICAL ANALYSIS; CHROMIUM ALLOYS; COBALT ALLOYS; DEPOSITION; IRIDIUM ALLOYS; IRON ALLOYS; LAYERS; MANGANESE ALLOYS; NICKEL ALLOYS; RUTHENIUM ALLOYS; SILICON ALLOYS; SPUTTERING; TANTALUM ALLOYS; X RADIATION
- Descriptors DEC
- ALLOYS; ELECTROMAGNETIC RADIATION; IONIZING RADIATIONS; MAGNETIC MATERIALS; MAGNETISM; MATERIALS; PLATINUM METAL ALLOYS; RADIATIONS; TRANSITION ELEMENT ALLOYS
Optional Information
- Notes
- (c) 2011 American Institute of Physics