Published 1998 | Version v1
Book

State-of-the-art X-ray photoelectron spectroscopy (XPS): Conventional and synchrotron x-ray sources for micro-XPS

  • 1. Charles Evans and Associates, Redwood City, CA (United States)
  • 2. Lawrence Berkeley National Lab., CA (United States). Advanced Light Source

Description

This paper presents preliminary data on analyses of selected materials using two state-of-the-art XPS systems: the Physical Electronics Inc. (PHI, Eden Prairie, MN) Quantum 2000 instrument and the microXPS beamline (7.3.2.1) at the Advanced Light Source (ALS). This research compares and contrasts relevant performance characteristics of the two systems including elemental and chemical state detection sensitivity, imaging capabilities including lateral resolution and useful image fields, role of X-ray dose damage to surface, analysis speed as well as analytical throughput

Additional details

Publishing Information

Publisher
Materials Research Society
Imprint Place
Warrendale, PA (United States)
ISBN
1-55899-430-0
Imprint Title
Applications of synchrotron radiation techniques to materials science 4
Imprint Pagination
398 p.
Series
Materials Research Society symposium proceedings, Volume 524
Journal Page Range
p. 221-226
ISSN
0272-9172

Conference

Title
Spring meeting of the Materials Research Society
Dates
13-17 Apr 1998
Place
San Francisco, CA (United States)

Optional Information

Secondary number(s)
CONF-980405--