Improved thermal stability of Sb materials by SiO2 doping for ultra-fast phase change memory application
Creators
- 1. State Key Lab of Silicon Materials, Zhejiang University, Hangzhou 310027 (China)
- 2. School of Mathematics and Physics, Jiangsu University of Technology, Changzhou 213001 (China)
- 3. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050 (China)
Description
SiO2-doped Sb material is proved to be a promising candidate for phase change memory (PCM) use because of its high crystallization temperature (∼239 °C), large crystallization activation energy (4.05 eV), and good data retention ability (162 °C for 10 years). The band gap is broadened and the grain size is refined by SiO2 doping. The reversible resistance transition can be achieved by an electric pulse as short as 5 ns for the PCM cell based on SiO2-doped Sb material. A lower operation power consumption (the energy for RESET operation 1.1 × 10−11 J) is obtained. In addition, SiO2-doped Sb material shows a good endurance of 2.5 × 105 cycles. - Highlights: • SiO2-doped Sb material were investigated in details for its potential application in phase change memory. • The resistance and thermal stability of Sb materials were greatly improved after SiO2-doping. • The ultra-fast switching speed of 5 ns and low power 1.1 × 10−11 J were obtained for SiO2-doped Sb material. • The structural and stress analysis was carried out by X-ray diffraction and Atomic Force Microscope, respectively. • The SiO2-doped Sb was a promising candidate for low power and high-speed PCM applications.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jallcom.2017.08.228Additional details
Identifiers
- DOI
- 10.1016/j.jallcom.2017.08.228;
- PII
- S0925-8388(17)32954-7;
Publishing Information
- Journal Title
- Journal of Alloys and Compounds
- Journal Volume
- 727
- Journal Page Range
- p. 986-990
- ISSN
- 0925-8388
- CODEN
- JALCEU
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 49073546
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ACTIVATION ENERGY; ATOMIC FORCE MICROSCOPY; DOPED MATERIALS; GRAIN SIZE; SILICA; SILICON OXIDES; STRESS ANALYSIS; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; ENERGY; MATERIALS; MICROSCOPY; MICROSTRUCTURE; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; SCATTERING; SILICON COMPOUNDS; SIZE
Optional Information
- Copyright
- Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.