Published December 15, 2017 | Version v1
Journal article

Improved thermal stability of Sb materials by SiO2 doping for ultra-fast phase change memory application

  • 1. State Key Lab of Silicon Materials, Zhejiang University, Hangzhou 310027 (China)
  • 2. School of Mathematics and Physics, Jiangsu University of Technology, Changzhou 213001 (China)
  • 3. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050 (China)

Description

SiO2-doped Sb material is proved to be a promising candidate for phase change memory (PCM) use because of its high crystallization temperature (∼239 °C), large crystallization activation energy (4.05 eV), and good data retention ability (162 °C for 10 years). The band gap is broadened and the grain size is refined by SiO2 doping. The reversible resistance transition can be achieved by an electric pulse as short as 5 ns for the PCM cell based on SiO2-doped Sb material. A lower operation power consumption (the energy for RESET operation 1.1 × 10−11 J) is obtained. In addition, SiO2-doped Sb material shows a good endurance of 2.5 × 105 cycles. - Highlights: • SiO2-doped Sb material were investigated in details for its potential application in phase change memory. • The resistance and thermal stability of Sb materials were greatly improved after SiO2-doping. • The ultra-fast switching speed of 5 ns and low power 1.1 × 10−11 J were obtained for SiO2-doped Sb material. • The structural and stress analysis was carried out by X-ray diffraction and Atomic Force Microscope, respectively. • The SiO2-doped Sb was a promising candidate for low power and high-speed PCM applications.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jallcom.2017.08.228

Additional details

Identifiers

DOI
10.1016/j.jallcom.2017.08.228;
PII
S0925-8388(17)32954-7;

Publishing Information

Journal Title
Journal of Alloys and Compounds
Journal Volume
727
Journal Page Range
p. 986-990
ISSN
0925-8388
CODEN
JALCEU

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
49073546
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ACTIVATION ENERGY; ATOMIC FORCE MICROSCOPY; DOPED MATERIALS; GRAIN SIZE; SILICA; SILICON OXIDES; STRESS ANALYSIS; X-RAY DIFFRACTION
Descriptors DEC
CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; ENERGY; MATERIALS; MICROSCOPY; MICROSTRUCTURE; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; SCATTERING; SILICON COMPOUNDS; SIZE

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.