Published April 1982
| Version v1
Journal article
Preparation of titanium carbide films by reactive R.F. sputtering, 2
Creators
- 1. Hokkaido Univ., Sapporo (Japan). Faculty of Engineering
Description
no abstract available
Additional details
Publishing Information
- Journal Title
- Shinku
- Journal Volume
- 25
- Journal Issue
- 4
- Series
- Shinku.
- Journal Page Range
- 221-224
- ISSN
- 0559-8516
Conference
- Title
- 22. vacuum symposium.
- Dates
- 5-7 Nov 1981.
- Place
- Tokyo (Japan).
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 15015056
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference, No Abstract
- Descriptors DEI
- BINDING ENERGY; ENERGY SPECTRA; FILMS; IMPURITIES; METHANE; PRESSURE DEPENDENCE; SPUTTERING; SURFACE COATING; THERMONUCLEAR REACTOR WALLS; TITANIUM CARBIDES; X-RAY DIFFRACTION; X-RAY EMISSION ANALYSIS
- Descriptors DEC
- ALKANES; CARBIDES; CARBON COMPOUNDS; CHEMICAL ANALYSIS; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ENERGY; HYDROCARBONS; NONDESTRUCTIVE ANALYSIS; ORGANIC COMPOUNDS; SCATTERING; SPECTRA; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- Published in summary form only.