Electron irradiation effect on thermal stability of Ni-Si-B amorphous alloy

The methods of high-voltage transmission microscopy and resistometry have been used to carry out investigation of electron irradiation effect on stability of Ni-Si-B amorphous alloy at heating. It is shown that irradiation by 1000 keV electrons during heating in column of electron microscope significantly changes the stability of the amorphous alloy, decreasing temperature range of transition from amorphous into crystalline state. Crystallization of the amorphous alloy proceeds by the way of quasieutectic reaction and following decomposition of supersaturated solid solution of boron and nickel in silicon. Kinetic dependencies of the alloy phase transition from amorphous state into crystalline at isothermal heating are determined