Published September 1991 | Version v1
Journal article Metadata-only

Lanthanoid titanate film structure deposited at different temperatures in vacuum

Creators

  • 1. Kievskij Gosudarstvennyj Univ., Kiev (Ukraine)

Description

Influence of deposition temperature on the structure of lanthanoid titanate films, prepared by the method of high-rate vacuum condensation. It is shown that formation of crystal structure, close to equilibrium samples, proceeds at 1100-1300 deg C deposition temperatures. Increase of temperature in this range promotes formation of films with higher degree of structural perfection. Amorphous films of lanthanoid titanates form at 200-1000 deg C. Deposition temperature shouldn't exceed 1400 deg C to prevent the formation of perovskite like phases in films

Additional details

Additional titles

Original title (Russian)
Структура пленок титанатов лантаноидов, осажденных при различных температурах в вакууме

Publishing Information

Journal Title
Neorganicheskie Materialy
Journal Volume
27
Journal Issue
9
Journal Page Range
p. 1988-1990.
CODEN
NEOMB8

INIS

Country of Publication
Russian Federation
Country of Input or Organization
Russian Federation
INIS RN
24032325
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
CRYSTAL STRUCTURE; FILM CONDENSATION; FILMS; RARE EARTH COMPOUNDS; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 1000-4000 K; TITANATES
Descriptors DEC
OXYGEN COMPOUNDS; TEMPERATURE RANGE; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; VAPOR CONDENSATION