Developing a Sagittally Focusing Double-Multilayer Monochromator

We report the development of a sagittally focusing double multilayer monochromator to produce a spatially extended, wide-bandpass x-ray beam from intense synchrotron bending-magnet source at the Advanced Photon Source for ultrafast x-radiography and -tomography applications. This monochromator consists of the two W/B4C multilayers with a 25-Aa periodicity coated on Si single-crystal substrates. The second crystal is mounted on a saggitally focusing bender which can; dynamically change the bending radius of the crystal in order to focus the beam to various points along the beamline. With this new apparatus, it becomes possible to adjust the x-ray beam size to best match the area detector size and the object size to facilitate a more efficient data collection using ultrafast x-radiography and -tomography