Published April 1992 | Version v1
Journal article Metadata-only

A mass transfer model for the plasma deposition process in axial-flow reactor

Creators

  • 1. Department of Physics, Huazhong University of Science and Technology, Wuhan (China)

Description

A kinetic model for the glow discharge plasma deposition process in the axial-flow reactor is proposed. In particular, the relationships between deposition characteristics (i.e., generation rate, generation frequency, deposition rate, and gas efficiency) and the process parameters (gas flow rate and gas pressure) are examined by numerical modeling technique. Some results has been explained

Additional details

Publishing Information

Journal Title
Acta Physica Sinica
Journal Volume
41
Journal Issue
4
Journal Page Range
p. 617-622.
ISSN
1000-3290
CODEN
WLHPAR

INIS

Country of Publication
China
Country of Input or Organization
China
INIS RN
24040587
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
CHEMICAL VAPOR DEPOSITION; EFFICIENCY; ELECTRON DENSITY; GLOW DISCHARGES; MASS TRANSFER; MATHEMATICAL MODELS; NUMERICAL SOLUTION; PIPES; PLASMA; VELOCITY
Descriptors DEC
CHEMICAL COATING; DEPOSITION; ELECTRIC DISCHARGES; SURFACE COATING