Published June 1977
| Version v1
Journal article
Computer simulation of tungsten field evaporation by field-ion microscope
Creators
- 1. Institute of Theoretical and Experimental Physics, 117259 Moscow, USSR
Description
An idea of the use of the computer simulation of the field evaporation process in the field-ion microscope for the interpretation of the experimental data of this process is developed. The computer program is suggested and the results of a quantitative analysis of the process in the continuous regime (electric field intensity F is constant) are given for tungsten. (Auth.)
Additional details
Identifiers
Publishing Information
- Journal Title
- Surface Science
- Journal Volume
- 65
- Journal Issue
- 1
- Series
- Surf. Sci.
- Journal Page Range
- 354-360
- ISSN
- 0039-6028
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 8341655
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ATOMS; COMPUTER CALCULATIONS; ELECTRIC FIELDS; EVAPORATION; ION MICROSCOPY; SIMULATION; TUNGSTEN
- Descriptors DEC
- ELEMENTS; METALS; MICROSCOPY; PHASE TRANSFORMATIONS; TRANSITION ELEMENTS
Optional Information
- Notes
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