Published February 15, 2013 | Version v1
Journal article

Composition and conductance distributions of single GeSi quantum rings studied by conductive atomic force microscopy combined with selective chemical etching

  • 1. State Key Laboratory of Surface Physics and Physics Department, Fudan University, Shanghai 200433 (China)

Description

Atomic force microscopy imaging combined with selective chemical etching is employed to quantitatively investigate three-dimensional (3D) composition distributions of single GeSi quantum rings (QRs). In addition, the 3D quantitative composition distributions and the corresponding conductance distributions are simultaneously obtained on the same single GeSi QRs by conductive atomic force microscopy combined with selective chemical etching, allowing us to investigate the correlations between the conductance and composition distributions of single QRs. The results show that the QRs' central holes have higher Ge content, but exhibit lower conductance, indicating that the QRs' conductance distribution is not consistent with their composition distribution. By comparing the topography, composition and conductance profiles of the same single QRs before and after different etching processes, it is found that the conductance distributions of GeSi QRs do not vary with the change of composition distribution. Instead, the QRs' conductance distributions are found to be consistent with their topographic shapes, which can be supposed to be due to the shape determined electronic structures. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/24/6/065702

Additional details

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
24
Journal Issue
6
Journal Page Range
[7 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
44045977
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
ATOMIC FORCE MICROSCOPY; DISTRIBUTION; ELECTRONIC STRUCTURE; ETCHING; GERMANIUM SILICIDES; HOLES; NANOSTRUCTURES; RINGS; SHAPE; TOPOGRAPHY
Descriptors DEC
GERMANIUM COMPOUNDS; MICROSCOPY; SILICIDES; SILICON COMPOUNDS; SURFACE FINISHING