Composition and conductance distributions of single GeSi quantum rings studied by conductive atomic force microscopy combined with selective chemical etching
Creators
- 1. State Key Laboratory of Surface Physics and Physics Department, Fudan University, Shanghai 200433 (China)
Description
Atomic force microscopy imaging combined with selective chemical etching is employed to quantitatively investigate three-dimensional (3D) composition distributions of single GeSi quantum rings (QRs). In addition, the 3D quantitative composition distributions and the corresponding conductance distributions are simultaneously obtained on the same single GeSi QRs by conductive atomic force microscopy combined with selective chemical etching, allowing us to investigate the correlations between the conductance and composition distributions of single QRs. The results show that the QRs' central holes have higher Ge content, but exhibit lower conductance, indicating that the QRs' conductance distribution is not consistent with their composition distribution. By comparing the topography, composition and conductance profiles of the same single QRs before and after different etching processes, it is found that the conductance distributions of GeSi QRs do not vary with the change of composition distribution. Instead, the QRs' conductance distributions are found to be consistent with their topographic shapes, which can be supposed to be due to the shape determined electronic structures. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0957-4484/24/6/065702Additional details
Identifiers
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 24
- Journal Issue
- 6
- Journal Page Range
- [7 p.]
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44045977
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; DISTRIBUTION; ELECTRONIC STRUCTURE; ETCHING; GERMANIUM SILICIDES; HOLES; NANOSTRUCTURES; RINGS; SHAPE; TOPOGRAPHY
- Descriptors DEC
- GERMANIUM COMPOUNDS; MICROSCOPY; SILICIDES; SILICON COMPOUNDS; SURFACE FINISHING