Cylindrical films for electronics in low background physics searches
- 1. Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy NY (United States)
- 2. Department of Physics, University of Minnesota, Minneapolis MN (United States)
Description
A technique for manufacturing thin-film resistors on cylindrical substrates is demonstrated. These devices are aimed for application in rare-event detectors that must minimize radioactive backgrounds from trace impurities in electronic components inside the detector. Cylindrical, conducting Ni films were created via electron beam deposition, using a mechanism that rotates the substrate, to demonstrate proof of principle and measure the resistivity on axis and in azimuth. These films are characterized by measurements using a facsimile of the Van Der Pauw method combined with electrostatic simulations. In the two cylindrical samples made we observe anisotropic electrical behavior with resistivities of 1392.5, 888.5 n Ω m around the azimuth and of 81.9, 72.8 n Ω m along the axis of the sample. We show that this anisotropy is not caused just by the electron beam evaporation by measuring a planar rectangle sample made in the same process but without spinning which has estimated resistivities of 66.5, and 71.9 n Ω m in both directions, and calculated resistivity using the standard Van der Pauw equation of 66.1±2.8 n Ω m. In spite of the anisotropy in the cylindrical samples, we show that these films can be used as resistors.
Availability note (English)
Available from http://dx.doi.org/10.1088/1748-0221/14/05/P05005Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Instrumentation
- Journal Volume
- 14
- Journal Issue
- 05
- Journal Page Range
- p. P05005
- ISSN
- 1748-0221
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 51050600
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- ANISOTROPY; COORDINATES; CYLINDRICAL CONFIGURATION; DEPOSITION; ELECTRON BEAMS; ELECTROSTATICS; EVAPORATION; IMPURITIES; MANUFACTURING; ORIENTATION; RESISTORS; SIMULATION; SPACE DEPENDENCE; SUBSTRATES; THIN FILMS
- Descriptors DEC
- BEAMS; CONFIGURATION; ELECTRICAL EQUIPMENT; EQUIPMENT; FILMS; LEPTON BEAMS; PARTICLE BEAMS; PHASE TRANSFORMATIONS