Improvement of the performance of Tohoku microbeam system
Creators
- 1. Tohoku Univ., Dept. of Quantum Science and Energy Engineering, Sendai, Miyagi (Japan)
Description
A microbeam system was installed at Dynamitron laboratory at Tohoku University and is applicable to simultaneous in-air/in-vacuum PIXE, RBS, SE, and STIM analyses, and 3D μ-CT. Insufficient beam brightness of the source and field contamination of the microbeam line restricted spatial resolution. In order to improve the performance of Tohoku microbeam system, optimization and modification of the ion source and microbeam system were performed. By the modification of the system, the beam brightness of the system was increased to 1.0 pA·μm-2·mrad-2·MeV-1 at the half divergence of 0.2 mrad. Considering the brightness and the magnification, obtainable target current will be 200 and 900 pA for beam spot sizes of 1.0x1.0 and 2.0x2.0 μm2, respectively. The modification of the source meets both the lifetime and the performance. The parasitic field contamination of the system was reduced down to less than 0.5 % by replacing the beam scanner chamber and a part of beam duct. Both resolution and beam currents are sufficient for our applications of in-air/in-vacuum PIXE, RBS, SE, and STIM analyses and 3D PIXE-μ-CT. (author)
Availability note (English)
Available from http://dx.doi.org/10.1142/S0129083510001914Additional details
Identifiers
Publishing Information
- Journal Title
- International Journal of PIXE
- Journal Volume
- 20
- Journal Issue
- 1-2
- Journal Page Range
- p. 11-19
- ISSN
- 0129-0835
Conference
- Title
- 26. symposium on PIXE in Japan; 17. annual meeting of the Japan Society for Particle Induced X-ray Emission (PIXE) Research
- Dates
- 18-20 Nov 2009
- Place
- Chiba (Japan)
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 43000536
- Subject category
- S43: PARTICLE ACCELERATORS; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BEAM OPTICS; BEAM PROFILES; BEAM SCANNERS; BRIGHTNESS; CONTAMINATION; DYNAMITRONS; PERFORMANCE; PIXE ANALYSIS; SIZE; SPATIAL RESOLUTION
- Descriptors DEC
- ACCELERATORS; BEAM MONITORS; CHEMICAL ANALYSIS; ELECTROSTATIC ACCELERATORS; MEASURING INSTRUMENTS; MONITORS; NONDESTRUCTIVE ANALYSIS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; RESOLUTION; X-RAY EMISSION ANALYSIS
Optional Information
- Notes
- 16 refs., 4 figs.