Published January 2005 | Version v1
Journal article

Exchange bias and magnetization process of Co/CoO nanocomposite thin films

  • 1. Department of Materials Science, National University of Singapore, 10 Kent Ridge Road, Singapore 119260 (Singapore)
  • 2. Centre for Advanced Research of Ecomaterials, Institute of Environmental Science and Engineering, Singapore 637723 (Singapore)
  • 3. School of Mechanical Engineering, University of Western Australia, Crawley, WA6009 (Australia)

Description

Co/CoO nanocomposite thin films have been deposited by RF sputtering with different oxygen partial pressures in the working atmosphere. It has been found that the magnetic properties (exchange bias (EB), coercivity and remanence) of the films are strongly dependent on the oxygen partial pressure. Film deposited with an O2 pressure of 0.75x10-5 Torr shows a relatively high coercivity and high remanence ratio. Enhanced asymmetry of magnetization reversal appears in the film deposited with 1.5x10-5 Torr O2 partial pressure. When the O2 partial pressure is increased to 3.0x10-5 Torr, a strong reduction in EB and coercivity have been obtained. The investigation of the microstructure using high-resolution transmission electron microscope reveals that the change in EB, remanence and coercivity is probably related to the competition between dipolar interaction and exchange coupling. Magnetoresistance and extraordinary Hall effect (EHE) of the Co/CoO nanocomposite films is also investigated in dependence on oxygen partial pressure. The film deposited under 2.3x10-5 Torr of oxygen exhibits strongly enhanced asymmetric magnetization reversal and unusually high EHE with a high coercivity

Additional details

Identifiers

DOI
10.1016/j.jmmm.2004.07.044;
PII
S0304-8853(04)00802-9;

Publishing Information

Journal Title
Journal of Magnetism and Magnetic Materials
Journal Volume
285
Journal Issue
1-2
Journal Page Range
p. 224-232
ISSN
0304-8853
CODEN
JMMMDC

Optional Information

Copyright
Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.