Diagnostic of corrosion–erosion evolution for [Hf-Nitrides/V-Nitrides]n structures
- 1. Thin Film Group, Universidad del Valle, A.A. 25360, Cali (Colombia)
- 2. Powder Metallurgy and Processing of Solid Recycled Research Group, Universidad del Valle, Cali (Colombia)
- 3. Ingeniería Mecatrónica, Universidad Militar Nueva Granada, Bogotá (Colombia)
- 4. Department of Anatomy and Cell Biology, University of Illinois at Chicago, IL 60612 (United States)
- 5. Department of Bioengineering, University of Illinois at Chicago, IL 60612 (United States)
- 6. Center of Excellence for Novel Materials, CENM, Cali (Colombia)
Description
HfN/VN multilayered systems were grown on 4140 steel substrates with the aim to improve their electrochemical behavior. The multilayered coatings were grown via reactive r.f. magnetron sputtering technique by systematically varying the bilayer period (Λ) and the bilayer number (n) while maintaining constant the total coating thickness (∼ 1.2 μm). The coatings were characterized by X-ray diffraction (XRD), and electron microscopy. The electrochemical properties were studied by Electrochemical Impedance Spectroscopy and Tafel curves. XRD results showed preferential growth in the face-centered cubic (111) crystal structure for [HfN/VN]n multilayered coatings. The maximum corrosion resistance was obtained for coatings with (Λ) equal to 15 nm, corresponding to bilayer n = 80. Polarization resistance and corrosion rate was around 112.19 kΩ cm2 and 0.094*10−3 mmy respectively; moreover, these multilayered system showed a decrease of 80% on mass loss due to the corrosive–erosive process, in relation to multilayered systems with n = 1 and Λ = 1200. HfN/VN multilayers have been designed and deposited on Si (100) and AISI 4140 steel substrates with bilayer periods (Λ) in a broad range, from nanometers to hundreds of nanometers to study the microstructural evolution and electrochemical progress with decreasing bilayer thickness. - Highlights: • Enhancements on surface electrochemical properties and response to surface corrosion attack. • Superficial phenomenon that occurs in corrosion surface of [Hf-Nitrides/V-Nitrides]n • Corrosion–erosion evolution for [Hf-Nitrides/V-Nitrides]n structures
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2013.07.081Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2013.07.081;
- PII
- S0040-6090(13)01287-X;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 545
- Journal Page Range
- p. 194-199
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46128313
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- COATINGS; CORROSION; CORROSION RESISTANCE; ELECTROCHEMISTRY; ELECTRON MICROSCOPY; EROSION; FCC LATTICES; HAFNIUM NITRIDES; IMPEDANCE; LAYERS; MICROSTRUCTURE; POLARIZATION; SUBSTRATES; SURFACES; THICKNESS; THIN FILMS; VANADIUM NITRIDES; X-RAY DIFFRACTION
- Descriptors DEC
- CHEMICAL REACTIONS; CHEMISTRY; COHERENT SCATTERING; CRYSTAL LATTICES; CRYSTAL STRUCTURE; CUBIC LATTICES; DIFFRACTION; DIMENSIONS; FILMS; HAFNIUM COMPOUNDS; MICROSCOPY; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; REFRACTORY METAL COMPOUNDS; SCATTERING; THREE-DIMENSIONAL LATTICES; TRANSITION ELEMENT COMPOUNDS; VANADIUM COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.