Multichannel Discharge Characteristics of Gas Switch Gap in SF6-N2 or SF6-Ar Gas Mixtures Under Nanosecond Triggering Pulses
Creators
- 1. School of Electrical Engineering, Xi'an Jiaotong University, Xi'an 710049 (China)
Description
Experiments were carried out to ascertain multichannel discharge characteristics in a self-designed coaxial field-distortion gas switch filled with SF6-N2 or SF6-Ar gas mixtures of different mixing ratios. In these experiments, the pressure varied from 0.1 MPa to 0.2 MPa, the voltage pulse peak applied to the switch was in the range from 40 kV to 78 kV, and the pulse rise time was 11 ns. The static breakdown strength of the gas switch gap in the switch was also measured. The results show that in general the average number of discharge channels for SF6-Ar or SF6-N2 gas mixture which contains less SF6 is larger than that for gas mixture which contains more SF6, however, the average number of channels almost keeps constant as the gas mixing ratio varies when the pulse rise rate is high enough. The static breakdown strength of the gas switch gap decreases slightly as the content of argon or nitrogen increases. (15th asian conference on electrical discharge)
Availability note (English)
Available from http://dx.doi.org/10.1088/1009-0630/13/6/16Additional details
Identifiers
Publishing Information
- Journal Title
- Plasma Science and Technology
- Journal Volume
- 13
- Journal Issue
- 6
- Journal Page Range
- p. 719-723
- ISSN
- 1009-0630
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44004171
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S42: ENGINEERING;
- Descriptors DEI
- ARGON; BREAKDOWN; ELECTRIC DISCHARGES; MIXING; NITROGEN; PEAKS; PRESSURE RANGE KILO PA; PULSE RISE TIME; PULSES; SULFUR FLUORIDES; SWITCHES
- Descriptors DEC
- ELECTRICAL EQUIPMENT; ELEMENTS; EQUIPMENT; FLUIDS; FLUORIDES; FLUORINE COMPOUNDS; GASES; HALIDES; HALOGEN COMPOUNDS; NONMETALS; PRESSURE RANGE; RARE GASES; SULFUR COMPOUNDS; SULFUR HALIDES; TIMING PROPERTIES