Published August 14, 2011 | Version v1
Journal article

Determining concentration depth profiles in fluorinated networks by means of electric force microscopy

  • 1. Centro de Fisica de Materiales CSIC-UPV/EHU, Materials Physics Center (MPC), Paseo Manuel de Lardizabal 5, 20018 San Sebastian (Spain)
  • 2. Institute of Materials Science and Technology (INTEMA), University of Mar del Plata and National Research Council (CONICET), JB. Justo 4302, Mar del Plata, Buenos Aires (Argentina)
  • 3. Departamento de Fisica de Materiales UPV/EHU, Facultad de Quimica, 20080 San Sebastian (Spain)
  • 4. Donostia International Physics Center, Paseo Manuel de Lardizabal 4, 20018 San Sebastian (Spain)

Description

By means of electric force microscopy, composition depth profiles were measured with nanometric resolution for a series of fluorinated networks. By mapping the dielectric permittivity along a line going from the surface to the bulk, we were able to experimentally access to the fluorine concentration profile. Obtained data show composition gradient lengths ranging from 30 nm to 80 nm in the near surface area for samples containing from 0.5 to 5 wt. % F, respectively. In contrast, no gradients of concentration were detected in bulk. This method has several advantages over other techniques because it allows profiling directly on a sectional cut of the sample. By combining the obtained results with x-ray photoelectron spectroscopy measurements, we were also able to quantify F/C ratio as a function of depth with nanoscale resolution.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Chemical Physics
Journal Volume
135
Journal Issue
6
Journal Page Range
p. 064704-064704.5
ISSN
0021-9606
CODEN
JCPSA6

Optional Information

Notes
(c) 2011 American Institute of Physics