Published 1993 | Version v1
Report

One-dimensional simulation studies of breakdown and electron beam generation processes for a hollow cathode pseudospark discharge

  • 1. Univ. of Maryland, College Park, MD (United States)

Description

The authors have developed a 1-D model to study the importance of some of the basic physical processes involved in a low pressure discharge. Their results show that during the early stage of the discharge, the emitted electron current comes mainly from the secondary emission off the cathode. Meanwhile, a quasi-neutral plasma column is being formed in the gap via ionization. The growing plasma oscillations are excited by the fast electrons from the cathode as they pass through the plasma due to the two-stream instability. The oscillation heats the background electrons to energies above the ionization threshold and ultimately leads to a rapid increase in both the plasma density and electron current to the anode. To their knowledge previous pseudospark models have not included ionization of the ambient gas due to the heated background charged particles within the dense quasi-neutral plasma region. Under this 1-D model, the discharge approximately satisfies a Paschen's Law in the low pressure regime

Additional details

Publishing Information

Imprint Title
Proceedings of the 1993 Particle Accelerator Conference: Volume 4
Imprint Pagination
738 p.
Journal Page Range
p. 3075-3077.
Report number
DOE/ER/40779--1-Vol.4

Conference

Title
international particle accelerator conference.
Acronym
PAC '93
Dates
17-20 May 1993.
Place
Washington, DC (United States).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
26026985
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Resource subtype / Literary indicator
Conference, Non-conventional Literature
Descriptors DEI
BEAM PRODUCTION; BREAKDOWN; COMPUTERIZED SIMULATION; ELECTRON BEAMS; HOLLOW CATHODES
Descriptors DEC
BEAMS; CATHODES; ELECTRODES; LEPTON BEAMS; PARTICLE BEAMS; SIMULATION

Optional Information

Secondary number(s)
CONF-930511--Vol.4.