Published June 2019 | Version v1
Journal article

Composition, Structure, and Semiconductor Properties of Chemically Deposited SnSe Films

  • 1. Ural Federal University named after the first President of Russia B.N. Yeltsin (Russian Federation)
  • 2. Institute of Solid State Chemistry, Ural Branch, Russian Academy of Sciences (Russian Federation)

Description

Highly adhesive tin-monoselenide (SnSe) layers (200 ± 10) nm thick are grown by hydrochemical deposition from a trilonate reactive mixture. X-ray diffraction shows that the synthesized films crystallize in the orthorhombic system (space group Pnma). The significant oxygen content in the film surface layers is explained by the partial oxidation of samples with SnO2 phase formation. The results of ion etching to a depth of 18 nm show a sharp decrease in the oxygen content over thickness and real correspondence to the SnSe elemental composition. The band gap determined by optical studies for direct transitions is 1.69 eV. The synthesized SnSe layers exhibit p-type conductivity, which is characteristic of this material.

Additional details

Identifiers

Publishing Information

Journal Title
Semiconductors (Woodbury, N.Y., Print)
Journal Volume
53
Journal Issue
6
Journal Page Range
p. 853-859
ISSN
1063-7826
CODEN
SMICES

Optional Information

Copyright
Copyright (c) 2019 Pleiades Publishing, Ltd.