Characterization of multiple-layer thin films by x-ray fluorescence and reflectivity techniques

Layer structures of multiple-layer thin films determined by conventional x-ray fluorescence and specular x-ray reflectivity techniques are discussed. Precision composition and layer thicknesses of two triple-layer NiFe, Cu, and Cr thin films were determined by x-ray fluorescence. Values of layer thickness, density, and roughness of a six-layer Ta/FeMn/NiFe/Cu/NiFe/Ta thin film were obtained by x-ray reflectivity. Layer thicknesses of two Au/NiFe multilayers determined by x-ray fluorescence and reflectivity were compared. Results showed that the x-ray fluorescence and reflectivity techniques are complimentary. The use of both techniques for layer-structure determination improves the reliability of the analysis. (author)