Published 2019 | Version v1
Miscellaneous

Evaluation of dependence of superconducting characteristics on the multilayer thin-film structure with various thicknesses by using the third harmonic voltage method

  • 1. High Energy Accelerator Research Organization (KEK), Tsukuba, Ibaraki (Japan)
  • 2. Kyoto University, Institute for Chemical Research (ICR), Uji, Kyoto (Japan)
  • 3. Graduate University for Advanced Studies (SOKENDAI), Tsukuba, Ibaraki (Japan)
  • 4. ULVAC, Inc., Chigasaki, Kanagawa (Japan)

Description

In recent years, it has been pointed out that the maximum accelerating gradient of a superconducting RF cavity can be increased by coating the inner surface of the cavity with a multilayer thin-film structure consisting of alternating insulating and superconducting layers. In this structure, the principal parameter that limits the performance of the cavity is the critical magnetic field or effective HC1 at which vortices begin penetrating into the superconductor layer. This is predicted to depend on the combination of the film thickness. We made samples that have a NbN/SiO2 thin-film structure on a pure Nb substrate with several layers of NbN film deposited using DC magnetron sputtering method. Here, we report the measurement results of effective HC1 of NbN/SiO2(30 nm)/Nb multilayer samples with thicknesses of NbN layers in the range from 50 nm to 800 nm by using the third-harmonic voltage method. Experimental results show that an optimum thickness exists, which increases the effective HC1 by 23.8%. (author)

Availability note (English)

Available from https://www.pasj.jp/web_publish/pasj2019/proceedings/PDF/THPI/THPI001.pdf
Part of:
Proceedings of the 16th annual meeting of Particle Accelerator Society of Japan

Additional details

Additional titles

Original title (Japanese)
第三高調波電圧誘導法を用いた多層薄膜試料の超伝導特性の膜厚依存性の評価

Publishing Information

Imprint Title
Proceedings of the 16th annual meeting of Particle Accelerator Society of Japan
Imprint Pagination
[1296 p.]
Journal Page Range
p. 703-705

Conference

Title
16. annual meeting of Particle Accelerator Society of Japan
Acronym
PASJ2019
Dates
31 Jul - 3 Aug 2019
Place
Kyoto (Japan)

Optional Information

Notes
11 refs., 3 figs. Imprint:#7B2C#16#56DE# #65E5##672C##52A0##901F##5668##5B66##4F1A##5E74##4F1A#