Ion mass-to-charge ratio in planar magnetron plasma with electron injections
- 1. High Current Electronics Institute Russian Academy of Sciences, Tomsk, 634055 (Russian Federation)
Description
The mass-to-charge ratio of ions in the plasma of a planar magnetron with central or peripheral electron injection was measured. Two modes of magnetron discharge were used: DC (up to 200 mA) and pulsed (up to 5 A, 50 µs, 300 Hz). The mass-to-charge measurements were made by using a modified quadrupole mass spectrometer. Experiments were carried out with copper magnetron cathode (target) and argon as operating gas. The analysis suggests that decreasing the operating pressure from 1.5 × 10−3 to 5 × 10−4 Torr increases the argon ion fraction by approximately 10%–30%. Increase in the amplitude of the magnetron pulsed current from 1 to 5 A increases the Cu ion fraction from 35% to 83%. At a constant operating pressure and magnetron discharge current, the ion mass-to-charge ratio of ions in plasma is little affected by injected electron current. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1361-6463/aadbd6Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 51
- Journal Issue
- 41
- Journal Page Range
- [8 p.]
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 52054696
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- APPROXIMATIONS; ARGON IONS; MAGNETRONS; QUADRUPOLES
- Descriptors DEC
- CALCULATION METHODS; CHARGED PARTICLES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; IONS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; MULTIPOLES