Published October 17, 2018 | Version v1
Journal article

Ion mass-to-charge ratio in planar magnetron plasma with electron injections

  • 1. High Current Electronics Institute Russian Academy of Sciences, Tomsk, 634055 (Russian Federation)

Description

The mass-to-charge ratio of ions in the plasma of a planar magnetron with central or peripheral electron injection was measured. Two modes of magnetron discharge were used: DC (up to 200 mA) and pulsed (up to 5 A, 50 µs, 300 Hz). The mass-to-charge measurements were made by using a modified quadrupole mass spectrometer. Experiments were carried out with copper magnetron cathode (target) and argon as operating gas. The analysis suggests that decreasing the operating pressure from 1.5  ×  10−3 to 5  ×  10−4 Torr increases the argon ion fraction by approximately 10%–30%. Increase in the amplitude of the magnetron pulsed current from 1 to 5 A increases the Cu ion fraction from 35% to 83%. At a constant operating pressure and magnetron discharge current, the ion mass-to-charge ratio of ions in plasma is little affected by injected electron current. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6463/aadbd6

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
51
Journal Issue
41
Journal Page Range
[8 p.]
ISSN
0022-3727
CODEN
JPAPBE

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
52054696
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
APPROXIMATIONS; ARGON IONS; MAGNETRONS; QUADRUPOLES
Descriptors DEC
CALCULATION METHODS; CHARGED PARTICLES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; IONS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; MULTIPOLES