Published 2011 | Version v1
Journal article

Sputtering deposition and characterization of epitaxial LSMO thin films

  • 1. Karlsruher Institut fuer Technologie, Institut fuer Nanotechnologie, D-76344 Eggenstein-Leopoldshafen (Germany)

Description

We report on the heteroepitaxial deposition of La1-xSrxMnO3 (LSMO) thin films using RF and DC magnetron sputtering. Co-deposition from the two different LSMO targets with x=0.25 and x=0.35 was used to tailor the desired composition to control ferromagnetic Curie temperature of the films. The influence of different single crystalline substrates as well as the effect of varying the oxygen partial pressure on magnetic and structure properties during deposition was investigated. The chemical stoichiometry was determined by Rutherford backscattering spectroscopy (RBS). Transmission electron microscopy and high resolution X-ray diffractometry (HRXRD) confirmed epitaxial growth for substrates with low in-plane lattice mismatch. The temperature dependence of the electric resistance agrees with the TCurie determined by (zero) field-cooling (FC/ZFC) superconductive quantum interference device SQUID measurements.

Additional details

Publishing Information

Journal Title
Verhandlungen der Deutschen Physikalischen Gesellschaft
Journal Issue
Dresden 2011 issue
Series
Also available as printed version: Verhandlungen der Deutschen Physikalischen Gesellschaft v. 46(1)
Journal Page Range
[1 p.]
ISSN
0420-0195
CODEN
VDPEAZ

Conference

Title
75. Annual meeting of the DPG and combined DPG Spring meeting of the condensed matter section and the section AMOP with further DPG divisions environmental physics, history of physics, microprobes, radiation and medical physics, as well as the working groups energy, equal opportunities, industry and business, information, philosophy of physics, physics and disarmament, young DPG
Dates
13-18 Mar 2011
Place
Dresden (Germany)

Optional Information

Notes
Session: MA 63.60 Fr 11:00; No further information available